Perovskite Cell Sputtering Equipment
Classification:
Designed for university and research institute laboratories for the preparation and study of various materials, including metals, semiconductors, nanotechnology, and insulators.
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Details Introduction
PD-500c/600c magnetron sputtering equipment is designed for university and research institute laboratories for the preparation and study of various materials, including metals, semiconductors, nanotechnology, and insulators.
1.Siemens PLC + touch screen for manual/automatic control, or fully automatic computer control.
2.Equipped with four 2–4 inch magnetron sputtering targets, capable of sputtering on 2–8 inch wafers; uniformity within an 8-inch tray is better than ±3%~±5%.
3.Optional sample loading function available.
Parameter
|
Chamber Dimensions(304 stainless steel) (L x W x Hmm) |
500×500×500mm/600x600x500mm |
| Ultimate Vacuum | ≤5.0×10⁻⁵ Pa |
| Pumping Speed | From atmosphere to 8×10⁻⁴ Pa≤30 min |
| Substrate Holder | Max. heating temperature: 500-800℃ |
| Sputtering Size |
Up to 8-inch wafers;Supports 4-inch, 2-inch, Φ45mm, Φ30mm;Small square substrates Rotation speed: 0-30 rpm (continuously adjustable) |
Description
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Production Strength
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