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Magnetron Sputtering Coating Equipment

Classification:

This is a continuous multi-chamber magnetron sputtering system for depositing metal, dielectric, and oxide films such as Ti, Cu, Ni, ITO, and NiO. It supports single- or double-sided multilayer coatings on substrates up to 600 × 600 mm.


Details Introduction


This PD-5000c equipment is a continuous multi-chamber magnetron sputtering coating system, suitable for depositing various metal films (such as Ti, Cu, Ni), dielectric films, and oxide films (including ITO and NiO). It can produce single-sided or double-sided single-layer and multilayer coatings on samples or workpieces up to 600mm × 600mm in size.

1.Equipped with loading and unloading carts for fast and convenient operation, saving coating production time.
2.Sample holder with mobility and bias voltage design enhances film adhesion strength.
3.Dual-track system ensures stability and reliability; smooth and consistent cart transfer and movement between chambers even under high-temperature conditions, guaranteeing high-quality film deposition.

Parameter


Vacuum Chamber (3/5 chambers)

2600x2200x450mm
Ultimate Vacuum 2.0×10⁻⁵ Pa
Substrate Holder

Heating temperature: ≥300°C, control accuracy: ±1°C, uniformity: ±3% to ±5%

Sputtering Targets 800 × 120 × 7 mm, 2–4 targets (configurable based on requirements)

Description

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Production Strength

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